|Product Name||Cobalt (Co)|
|Shape||Rectangle, Round, Rotary|
|Size||as your request|
|Technology||Vacuum Melting, Patented thermo-mechanical process and machine work|
|Application||Semiconductors, Micro-electronics and Magnetic Data Storage etc.|
The Cobalt sputtering targets we produced are high purity, it\'s most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically Certificate of analysis for 3N5 high purity Cobalt sputtering target.